Although chemical engineering principles are at the heart of solid state process technology, until now no reference volume addressing this relationship was available. This is the first book of its kind to tie fundamental engineering concepts to solid state process technology. Discussing the basic concepts involved--liquid-phase epitaxy, physical and chemical vapor deposition, diffusion and oxidation in silicon, resists in microlithography, etc.--this volume will be particularly useful in chemical engineering courses. It offers a framework within which specialized courses in microelectronics processing can be organized. In addition, it serves as a valuable reference source for all industrial engineers working with the individual process steps covered.268 phosphorus, 268 Printed wiring lxagt;ard with surface-mounted leadless ceramic chip carriers, 446/ Probabilitv ... 186/ Process sequence for integrated- circuit manufacture, 4 / Profile control alteration of specific chemistrv. 425 anisotropic etching, 423-425 control of erosion of masking layer, 422 schematic diagram.
|Title||:||Advances in Chemistry Series|
|Author||:||Dennis W. Hess, Klavs F. Jensen|