The Handbook of Semiconductor Manufacturing Technology describes the individual processes and manufacturing control, support, and infrastructure technologies of silicon-based integrated-circuit manufacturing, many of which are also applicable for building devices on other semiconductor substrates. Discussing ion implantation, rapid thermal processing, photomask fabrication, chip testing, and plasma etching, the editors explore current and anticipated equipment, devices, materials, and practices of silicon-based manufacturing. The book includes a foreword by Jack S. Kilby, cowinner of the Nobel Prize in Physics 2000 qfor his part in the invention of the integrated circuit.q... vs. energy, 397 Standard Mechanical InterFace (SMIF), 1058 Static modeling, 1111 Statistical Process Control (SPC), 714, ... 961, 966 Stress-Induced Leakage Current (SILC), 263 Stress Migration (SM), 301, 970 Supervisory run-to-run controller, ... 692 Utilization, 1103 Venn diagrams, 995 Vias, 291 Voiding (see Stress induced) Wafer, 71 epitaxial, 75 inspection, ... 1107 project planning, 1049 qualification, 1050 Wafer-level test, 986 Western Electric (WECO) rules, 725 Wet etching, anbsp;...
|Title||:||Handbook of Semiconductor Manufacturing Technology|
|Author||:||Yoshio Nishi, Robert Doering|
|Publisher||:||CRC Press - 2000-08-09|