Understanding and manipulation of the interaction forces has led to the design of novel semiconductor wafer cleaning solutions.Electrochemical and Solid-State Letters 2000, 3, (1), 47-49. 27. Glick, J. S. Characterization of deposition and removal of metallic impurities of the RCA standard clean. Semiconductor Pure Water and Chemicals Conference 1993, 12th, 93-102anbsp;...
|Title||:||Particle-wafer Interactions in Semiaqueous Silicon Cleaning Systems|
|Publisher||:||ProQuest - 2008|