Semiconductor Material and Device Characterization

Semiconductor Material and Device Characterization

4.11 - 1251 ratings - Source

... by Johnson in 1957, 9 by Quilliet and Gosar in 1960, 10 and by Goodman in 1961.11 It was Goodmana#39;s SPV approach that led to the first full-scale ... Through this relatively simple, contactless method, they were able to detect cracked furnace tubes, contaminated solid source diffusion ... 9.1 Schematic illustration of the various material/device parameters measurable with charge/ probe/light techniques.

Title:Semiconductor Material and Device Characterization
Author:Dieter K. Schroder
Publisher:John Wiley & Sons - 2006-02-10


You Must CONTINUE and create a free account to access unlimited downloads & streaming